Method for coating film by pulsed laser deposition with plasma grating
US12195841B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 17, 2023 |
| Grant date | Jan 14, 2025 |
| Priority date | — |
| Expiry date | Jul 25, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for film coating by pulsed laser deposition with a plasma grating includes: in step 1, providing a substrate and a target material; in step 2, generating a femtosecond pulsed laser beam which is split by a beam splitting module so as to form a plurality of femtosecond pulsed laser sub-beams; in step 3, performing a first excitation on the target material by one of the split femtosecond pulsed laser sub-beams as a pre-pulse after focus, to generate a first plasma; in step 4, synchronizing the rest of the split femtosecond pulsed laser sub-beams as post-pulses to form, after focus, filaments arriving at a surface of the target material simultaneously, to generate the plasma grating; and in step 5, performing a secondary excitation on the target material by the generated plasma grating to generate a second plasma depositing on the substrate to form the film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.