Apparatus for trapping multiple reaction by-products for semiconductor process
US12195849B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2021 |
| Grant date | Jan 14, 2025 |
| Priority date | — |
| Expiry date | Jan 20, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32871
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus is for trapping multiple reaction by-products for a semiconductor process, in which a trapping region is divided by a difference in vertical temperature distribution according to a distance spaced apart from a heater and by structures for switching flow path directions and generating multiple vortices using a trapping structure, and reaction by-product mixtures contained in a gas, which is discharged after a process of depositing multiple different thin film layers is performed in a process chamber during a semiconductor manufacturing process, is trapped by a single trapping apparatus, such that a reaction by-product, which is aggregated in the form of a thin film in a relatively high-temperature region, is trapped by a first trapping part in an upper region, and a reaction by-product, which is aggregated in the form of powder in a relatively low-temperature region, is trapped by a second trapping part in a lower region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.