Patent · US Active

Cleaning systems for additive manufacturing apparatuses and methods for using the same

US12202200B2 · kind B2 · utility

0Cited by

1References

15Claims

0Family size

Assignee

General Electric Company · US

Inventors

Timothy Francis Andrews · Sharonville, US
Victor Fulton · Amelia, US
Glen Charles Fedyk · Hamilton, US
Carlos H. Bonilla · Lebanon, US
Jacob Mayer · Cincinnati, US
John Sterle · Clifton Park, US
Vadim Bromberg · Niskayuna, US

Key dates

Filing date	Sep 14, 2023
Grant date	Jan 21, 2025
Priority date	—
Expiry date	Sep 14, 2043

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB33Y40/00
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

Embodiments of the present disclosure are directed to additive manufacturing apparatuses, cleaning stations incorporated therein, and methods of cleaning using the cleaning stations.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.