Gene sequencing structure, gene sequencing device and gene sequencing method

US12203131B2 · kind B2 · utility

Assignee

• Shanghai Tianma Micro-electronics Co., Ltd. · CN

Inventors

• Baiquan Lin · Shanghai, CN
• Kerui Xi · Shanghai, CN
• Kaidi ZHANG · Shanghai, CN
• Wei Li · Shanghai, CN
• Yunfei Bai · Fremont, US
• Ping SU · Shanghai, CN
• Junting Ouyang · Shanghai, CN

Key dates

• Filing date: Jan 20, 2022
• Grant date: Jan 21, 2025
• Expiry date: Jul 4, 2043

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N27/4145
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A gene sequencing structure, a gene sequencing device and a gene sequencing method are provided. The gene sequencing structure includes a substrate, a thin-film transistor array layer located on the substrate and including thin-film transistors that include a first electrode, and a second electrode; an ion-sensitive layer located on a side of the semiconductor layer away from the substrate; a micro-hole layer located on a side of the ion-sensitive layer away from the substrate, including a through-hole passing through the micro-hole layer, at least partially overlapping the semiconductor layer, and used for receiving a to-be-tested single-stranded nucleic acid inside; a conductive structure, located on a side of the layer away from the substrate and electrically connected to the first electrode or the second electrode; and a detection chip, located on a side of the conductive structure away from the substrate and electrically connected to the conductive structure.