Patent · US Active

Shared data induced quality control for a chemical mechanical planarization process

US12205061B2 · kind B2 · utility

0Cited by
2References
19Claims
0Family size

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Key dates

Filing dateMay 18, 2022
Grant dateJan 21, 2025
Priority date
Expiry dateApr 1, 2043

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06Q50/04
  • WIPO fieldIT methods for management
  • WIPO sectorElectrical engineering

Abstract

A method for developing or improving a process for producing a product from a material comprising steps of acquiring the composition for at least two slurries as raw material data (17) for the CMP based manufacturing process and its relevant parameters (2) by using a Data Collecting computer (9); physically performing specific method steps of a CMP process; measuring relevant parameters of the used slurries and the physically performed CMP process to determine the CMP process performance by using the Data Collecting computer (9); analyzing the measured data about the relevant parameters with a specific software performed on an Analyzing computer (11) by creating for the software and applying with it a predictive model using Machine Learning to understand the intercorrelation of the different parameters and using the results to improve the CMP process performance and the resulting product quality of the CMP based manufacturing process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.