Patent · US Active

Sample processing systems and methods

US12208382B2 · kind B2 · utility

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2References
24Claims
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Key dates

Filing dateMar 21, 2022
Grant dateJan 28, 2025
Priority date
Expiry dateJun 28, 2043

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2035/00138
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

The disclosure features methods, fluid delivery platforms, and apparatus for preparing a sample on a substrate that includes a substrate handler configured to move a substrate between a first position and a second position, and a platform positioned so that when the substrate is in the second position, the platform faces the substrate, where the platform includes a fluid delivery area having a second surface formed from a hydrophilic material for which a water contact angle is 40 degrees or less, and a first surface facing the substrate when the substrate is in the second position, formed from a hydrophobic material for which a water contact angle is 100 degrees or more.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.