Increased deposition efficiency via dual reactor system
US12209199B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | Apr 23, 2021 |
| Grant date | Jan 28, 2025 |
| Priority date | — |
| Expiry date | Sep 3, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45512
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing Parylene onto a substrate includes operating a first pyrolysis chamber at a first set of parameters to cause cracking of dimers into monomers at the first set of parameters and operating a second pyrolysis chamber at a second set of parameters to cause cracking of dimers into monomers at the second set of parameters. The method includes mixing the monomers at the first set of parameters with monomers at the second set of parameters together and polymerizing the mixture as a protective coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.