Smoothing surface roughness using atomic layer deposition
US12215419B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Apr 29, 2022 |
| Grant date | Feb 4, 2025 |
| Priority date | — |
| Expiry date | Jan 20, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C28/042
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods of producing an optical surface atop an exterior of a substrate that includes smoothing the exterior using an ALD process to sequentially deposit ALD layers to produce one or more ALD films that fill spaces between spaced-apart asperities existing on the exterior, and thereafter depositing a reflective material on the smoothed exterior of the substrate to produce the optical surface. The smoothing resulting from depositing the ALD film on the exterior of the substrate causes the grain size of the reflective material to be reduced in comparison to the grain size that would exists without having deposited the ALD film on the exterior of the substrate. The smoothing is sufficient to cause a reduction in grain size that results in a reduction in plasmon absorption in the optical surface in comparison to the plasmon absorption that would otherwise exist without having reduced the grain size of the reflective material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.