Optical measurement apparatus, measuring method using the same, and method for fabricating semiconductor device using the same
US12215974B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Oct 19, 2022 |
| Grant date | Feb 4, 2025 |
| Priority date | — |
| Expiry date | May 12, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A optical measurement apparatus includes: an optical system which generates a pupil image of a measurement target, using light; a polarization generator which generates a polarized light from the light; a self-interference generator which generates a plurality of beams divided from the pupil image, using the polarized light, and causes the plurality of beams to interfere with each other to generate a self-interference image; and an image analysis unit configured to extract phase data from the self-interference image, and to move the measurement target to a focus position on the basis of the phase data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.