Optical element for deconvolution
US12216277B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 11, 2022 |
| Grant date | Feb 4, 2025 |
| Priority date | — |
| Expiry date | Nov 23, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/20212
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In one embodiment, a method of constructing a corrective phase mask for an optical element, includes propagating, for each of one or more wavelengths, a point source field from an object plane to a corrective mask plane to determine a source field and propagating, for each of the one or more wavelengths, the point source field from an image plane to the corrective mask plane to determine an image field. The method may further include determining, for each of the one or more wavelengths, a phase modulation field based on the source field and the image field; and determining a multi-wavelength phase modulation field based on combining the phase modulation field for each of the one or more wavelengths.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.