Method and device for producing uniform films on moving substrates and films produced in this way

US12217947B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Michael Vergöhl · Destedt, DE
• Daniel Rademacher · Braunschweig, DE
• Tobias Zickenrott · Braunschweig, DE

Key dates

• Filing date: Oct 16, 2014
• Grant date: Feb 4, 2025
• Expiry date: Oct 16, 2034

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/332
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention relates to the deposition of optical precision films with high uniformity, precision, particle freedom and low absorption on the substrate. For this purpose, a method and a device are proposed. The approach is the use of target materials and also possibly of surfaces in the sputtering field. Particularly high uniformity and also particularly low residual absorption are achieved with these materials. The invention is suitable for the production of optical thin-film filters, as are used for example in laser material machining, laser components, optical sensors for measuring technology, or in medical diagnostics.