Mask and fabricating method thereof, and displaying base plate and fabricating method thereof
US12219865B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 17, 2021 |
| Grant date | Feb 4, 2025 |
| Priority date | — |
| Expiry date | Jul 27, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure provides a mask and a fabricating method thereof, and a displaying base plate and a fabricating method thereof, and relates to the technical field of displaying. The mask includes a mask part and a peripheral part surrounding the mask part; the mask part includes at least one mask unit, and the mask unit includes an opening and a first main body surrounding the opening; and a thickness of at least part of area of the peripheral part is greater than a thickness of the mask part, and the peripheral part is configured to contact a base plate to be formed with a film, and support the base plate to be formed with a film, whereby the mask part and the base plate to be formed with a film have a gap therebetween.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.