Patent · US Active

Equipment and method for depositing particles using laser shockwaves

US12220743B2 · kind B2 · utility

0Cited by
1References
15Claims
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Key dates

Filing dateOct 27, 2020
Grant dateFeb 11, 2025
Priority date
Expiry dateJun 29, 2041

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P10/25
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Equipment for selectively depositing, by shockwave-induced spraying, at least one particle on a deposition surface of a receiver substrate. The equipment including at least one laser source that emits a laser beam, a substrate carrier to which the substrate is fastened, a shockwave-generating layer having a first surface oriented toward the laser beam and a second surface oriented toward the deposition surface of the substrate, an optical system for directing and focusing the laser beam toward a focal region of the first surface. The second surface including a plurality of cavities, each cavity housing at least one particle. The laser beam generates a plasma in the focal region on the first surface and a shockwave that propagates within the generating layer from the first surface to the second surface in order to spray at least one particle in the direction of the deposition surface of the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.