Patent · US Active

Metal complexes having triazenido ligands and uses thereof for depositing metals from the gas phase

US12221456B2 · kind B2 · utility

0Cited by
1References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 12, 2018
Grant dateFeb 11, 2025
Priority date
Expiry dateNov 6, 2041

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/18
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The invention relates to the use of a metal complex, which has at least one ligand of the formula R1—N3—R2, wherein R1 and R2 are hydrocarbon moieties, for depositing the metal or a compound of the metal from the gas phase. The invention further relates to methods for depositing metals from the metal complexes, and to metal complexes, substituted triazene compounds and to methods for the production thereof.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.