Powder metallurgy sputtering targets and methods of producing same
US12221678B2 · kind B2 · utility
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82References
21Claims
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Assignee
Inventors
Key dates
| Filing date | Feb 27, 2019 |
| Grant date | Feb 11, 2025 |
| Priority date | — |
| Expiry date | May 2, 2042 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2999/00
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention relates to sputtering targets and other metal articles as well as methods of making the same. More particularly, the present invention relates to methods for forming powder metallurgy sputtering targets and other metallurgical articles made from metal powders that include spherical metal powders, and the resulting product.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.