Patent · US Active

CVD system with flange assembly for facilitating uniform and laminar flow

US12221695B2 · kind B2 · utility

0Cited by

18References

20Claims

0Family size

Assignees

Inventors

Elad Mentovich · Tel Aviv-Yafo, IL
Yaniv Rotem · Nesher, IL
Yaakov Gridish · Yoqneam Illit, IL
Doron Naveh · Petah Tikva, IL
Chen Stern · Kiryat Ono, IL
Yosi Ben-Naim · Eilat, IL
Ariel Ismach · Rosh HaAyin, IL
Eran Bar-Rabi · Shimshit, IL
Tal Kaufman · Shimshit, IL

Key dates

Filing date	Jul 1, 2021
Grant date	Feb 11, 2025
Priority date	—
Expiry date	Dec 12, 2043

Classification

Technology area (CPC F)Mechanical Engineering; Lighting; Heating
CPC primaryF15D1/06
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A first and a second flange assembly configured for facilitating uniform and laminar flow in a system are provided. The first flange assembly includes a first flange body configured to introduce a gas into a chamber. The first flange assembly includes a plurality of outlet tubes disposed on an interior surface of the first flange body and a plurality of inlet tubes disposed on an exterior surface of the first flange body and in fluid communication with the plurality of outlet tubes. The second flange assembly includes a second flange body configured to remove the gas from the chamber. The second flange assembly includes a plurality of through holes extending from an interior surface to an exterior surface of the second flange body and a plurality of exit tubes extending from the exterior surface of the second flange body and in fluid communication with the plurality of through holes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.