Polypeptide, photoresist composition including the same, and method of forming pattern using the same
US12222646B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | May 11, 2022 |
| Grant date | Feb 11, 2025 |
| Priority date | — |
| Expiry date | May 11, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2006
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A polypeptide, a photoresist composition including the polypeptide, and a method of forming patterns by using the photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.