Substrates having a broadband antireflection layer and methods of forming a broadband antireflection layer
US12224362B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | May 30, 2023 |
| Grant date | Feb 11, 2025 |
| Priority date | — |
| Expiry date | Jun 9, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F71/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Embodiments of the present disclosure provide for methods of making substrates having an (AR) antireflective layer, substrates having an antireflective layer, devices including a substrate having an antireflective layer, and the like. The AR layer can have a total specular reflection of less than 10% at a wavelength of about 400-800 nm, and a height of about 500-1000 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.