Selective laser etching of layered fluidistors
US12229340B2 · kind B2 · utility
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Key dates
| Filing date | Dec 16, 2020 |
| Grant date | Feb 18, 2025 |
| Priority date | — |
| Expiry date | Dec 20, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2027/0192
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
A method includes separately exposing selected portions of a first rigid substrate and a second rigid substrate to laser radiation, selectively etching the exposed portions of the first rigid substrate and the second rigid substrate using a chemical etchant and bonding the first rigid substrate to the second rigid substrate along a common interface to form a fluidic valve. The fluidic valve may be coupled to a fluidic haptics device, for example, which may be integrated into an artificial reality system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.