Defect image generation method for deep learning and system therefor
US12229932B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Sep 16, 2021 |
| Grant date | Feb 18, 2025 |
| Priority date | — |
| Expiry date | Nov 29, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30108
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of generating a defect image for deep learning and a system therefor are provided. The method and the system are intended to be used in generating training data for an artificial intelligence algorithm. More specifically, the training data are defect images required to train an algorithm that identifies a defect from a product.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.