Plasma reactor having array of coaxial multiple pins and processing low temperature plasma at high efficiency
US12230481B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 13, 2023 |
| Grant date | Feb 18, 2025 |
| Priority date | — |
| Expiry date | Jun 2, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32935
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor, configured to process low temperature plasma, includes: a rotating reactor, a fixed reactor, and a master tube. An end of the master tube is connected to two branched tubes, one of the two branched tubes is connected to the rotating reactor, and the other one of the two branched tubes is connected to the fixed reactor. When a flow rate of inlet gas is less than a threshold defined by a flow detector, all the gas enters the rotating reactor from one of the two branched tubes. When the flow rate of the inlet gas is greater than the threshold of the flow detector, a valve is configured to operate to allow a part of the inlet gas that exceeds the threshold to enter the fixed reactor from the other one of the two branched tubes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.