Atomic vapor source for quantum metrology
US12230492B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2024 |
| Grant date | Feb 18, 2025 |
| Priority date | — |
| Expiry date | Jul 30, 2044 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/24
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Embodiments herein describe using compressed source material to perform an atomic experiment or an atomic application within a vacuum chamber (e.g., an atom cooling and trapping apparatus). Source material is often refined and sold with dendritic or crystalline surfaces that result in a very large surface area. This surface area increases the likelihood that a large amount contaminants will form on the surface, which is especially true for reactive source materials. To mitigate the risk of contamination, in the embodiments herein the source material is compressed onto a substrate. This changes the material from having a dendritic or crystalline surface to a flat surface, which has a much smaller surface area and thus is less susceptible to contaminants which can, for example, improve the lifetime usage of the source material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.