Mask, mask device and mask design method
US12234540B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | May 27, 2020 |
| Grant date | Feb 25, 2025 |
| Priority date | — |
| Expiry date | Sep 26, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/166
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present disclosure relates to a mask, a mask device and a mask design method. The mask includes: a pattern area, wherein the pattern area includes a plurality of openings, among which adjacent openings are spaced apart by a first rib, and at least one of the plurality of openings has a non-straight side, two first straight sides intersecting with the non-straight side, and a second straight side opposite to the non-straight side and intersecting with the first straight sides; and a second rib located at an edge of the pattern area, wherein the second rib is provided with a cutout for compensating for stretch deformation of the non-straight side, extending lines of the two first straight sides extending toward the second rib along a first direction intersect with the second rib to obtain a first area, and the cutout is located at least within the first area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.