System and method with masking for certified defense against adversarial patch attacks
US12236695B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2022 |
| Grant date | Feb 25, 2025 |
| Priority date | — |
| Expiry date | Aug 31, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V20/52
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A computer-implemented system and method relate to certified defense against adversarial patch attacks. A set of one-mask images is generated using a first mask at a set of predetermined regions of a source image. The source image is obtained from a sensor. A set of one-mask predictions is generated, via a machine learning system, based on the set of one-mask images. A first one-mask image is extracted from the set of one-mask images. The first one-mask image is associated with a first one-mask prediction that is identified as a minority amongst the set of one-mask predictions. A set of two-mask images is generated by masking the first one-mask image using a set of second masks. The set of second masks include at least a first submask and a second submask in which a dimension of the first submask is less than a dimension of the first mask. A set of two-mask predictions is generated based on the set of two-mask images. Class data, which classifies the source image, is selected based on the set of two-mask predictions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.