Patent · US Active

Plasma ion processing of substrates

US12237150B2 · kind B2 · utility

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0References

16Claims

0Family size

Assignee

LIFEHOUSE AUSTRALIA AS TRUSTEE FOR THE LIFEHOUSE AUSTRALIA TRUST · AU

Inventors

David McKenzie · Chatswood, AU
Marcela Bilek · Cloncurry, AU
Aleksey Kondyurin · Sydney, AU
Elena Kosobrodova · Sydney, AU

Key dates

Filing date	Oct 16, 2020
Grant date	Feb 25, 2025
Priority date	—
Expiry date	Mar 26, 2041

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/3365
WIPO fieldMedical technology
WIPO sectorInstruments

Abstract

A method for plasma ion processing is described, including flowing a gas into porous material; and exposing the gas to a pulsed electric field whilst the gas is in the pores. The pulsed electric field ionises the gas to generate a plasma. The method may additionally include exposing the porous material to a gas so as to generate functionality. The method may additionally include exposing the functionalised porous material to a functional species so as to covalently attach said functional species to the surfaces of the pores.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.