Mitigating defects in an electrochromic device under a bus bar
US12240206B2 · kind B2 · utility
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33References
13Claims
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Key dates
| Filing date | Apr 13, 2023 |
| Grant date | Mar 4, 2025 |
| Priority date | — |
| Expiry date | Apr 13, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1524
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.