Nanoimprint lithography process and patterned substrate obtainable therefrom
US12242184B2 · kind B2 · utility
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3References
15Claims
0Family size
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Key dates
| Filing date | Mar 8, 2018 |
| Grant date | Mar 4, 2025 |
| Priority date | — |
| Expiry date | Dec 7, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a soft NIL process used for providing a sol-gel patterned layer on a substrate. Specifically, this process comprises a step of adjusting the solvent uptake of the sol-gel film to 10 to 50% vol., preferably between 15 and 40% vol., by varying the relative pressure of the solvent while a soft mould is applied onto the substrate coated with the sol-gel film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.