Semiconductor photoresist composition, method for preparing thereof and method of forming patterns using the composition
US12242189B2 · kind B2 · utility
0Cited by
7References
18Claims
0Family size
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Key dates
| Filing date | Nov 10, 2021 |
| Grant date | Mar 4, 2025 |
| Priority date | — |
| Expiry date | Jun 12, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07F7/2284
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor photoresist composition includes an organotin compound represented by Chemical Formula 1, and a solvent. A method for preparing the same, and a method of forming patterns utilizing the same are disclosed. Specific details of Chemical Formula 1 are as defined in the specification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.