Patent · US Active

Process for the preparation of synthetic quartz glass

US12246982B2 · kind B2 · utility

0Cited by

11References

7Claims

0Family size

Assignee

HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

Martin Thürer · Bitterfeld-Wolfen, DE
Walter Lehmann · Leipzig, DE
Martin Trommer · Bitterfeld-Wolfen, DE

Key dates

Filing date	Dec 16, 2021
Grant date	Mar 11, 2025
Priority date	—
Expiry date	Dec 16, 2041

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03B2207/70
WIPO fieldOther special machines
WIPO sectorMechanical engineering

Abstract

Described is a process for the production of synthetic fused silica in which the deposition surface is located for a period of at least 50% of the build-up time of the soot body at a burner distance in which the horizontally integrated luminous intensity of the flame of the burner used in the targetless state is still at least ⅔ of the maximum horizontally integrated luminous intensity of the flame.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.