Methods of forming an antireflective layer on a complex substrate and complex substrates having the antireflective layer
US12248123B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | Dec 19, 2018 |
| Grant date | Mar 11, 2025 |
| Priority date | — |
| Expiry date | Aug 6, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2218/32
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Described herein are antireflective layers, methods for forming antireflective layers, and structures including antireflective layers. Methods are included for forming a durable antireflective layer on the surface of a substrate, wherein the substrate has a complex three-dimensional shape, wherein the durable antireflective layer comprises a uniform monolayer of silica nanoparticles interconnected by SiO2, a uniform monolayer of silica nanoparticles bonded to the surface of the substrate, or a combination thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.