Photo-alignable positive c-plate retarder
US12248218B2 · kind B2 · utility
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20References
17Claims
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Key dates
| Filing date | Jul 20, 2020 |
| Grant date | Mar 11, 2025 |
| Priority date | — |
| Expiry date | Apr 16, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K2019/0448
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to material compositions and methods for generating photo-alignable positive c-plate retarders. Because a planar alignment direction can be induced in the surface of the above c-plate retarder by exposure to polarized light, a slave material can be aligned on the surface of the c-plate retarder with a defined azimuthal orientation direction, without the need of an additional orientation layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.