Patent · US Active

Method for manufacturing variable radio frequency micro-electromechanical switch

US12249468B2 · kind B2 · utility

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8References
1Claims
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Key dates

Filing dateDec 27, 2021
Grant dateMar 11, 2025
Priority date
Expiry dateFeb 25, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01H2059/0072
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A radio frequency micro-electromechanical switch (RF MEMS switch) is described. Also described is a method of producing such an RF MEMS switch. The method can include depositing on a substrate a first sacrificial layer and producing a pattern. A first layer of metal is deposited on the first sacrificial layer and on the substrate. A pattern is produced to form a first RF line and a first MEMS membrane. A second sacrificial layer is deposited on the first RF line and a pattern is produced. A dielectric layer is deposited on the second sacrificial layer and then a pattern is produced to form a dome. The first and second sacrificial layers are removed through a dome opening. A second metal layer is deposited on the dome and on the substrate, and then a pattern is produced to plug the dome opening(s) and to form a second RF line.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.