Apparatus for and method of manufacturing semiconductor device
US12252778B2 · kind B2 · utility
0Cited by
11References
7Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 9, 2022 |
| Grant date | Mar 18, 2025 |
| Priority date | — |
| Expiry date | Nov 22, 2042 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Disclosed are an apparatus for and a method of manufacturing a semiconductor device. The apparatus includes a chamber, an evaporator that evaporates an organic source to provide a source gas on a substrate in the chamber, a vacuum pump that pumps the source gas and air from the chamber, an exhaust line between the vacuum pump and the chamber, and an analyzer connected to the exhaust line. The analyzer detects a derived molecule produced from the organic source and determines a replacement time of the evaporate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.