Patent · US Active

System and method for detecting a defect in a specimen

US12253472B2 · kind B2 · utility

0Cited by

4References

18Claims

0Family size

Assignee

GLOBALFOUNDRIES U.S. Inc. · US

Inventors

Richard P. Good · Austin, US
Roberto Schiwon · Dresden, DE
Matthias Ruhm · Dresden, DE
Dirk Wollstein · Dresden, DE

Key dates

Filing date	Nov 7, 2022
Grant date	Mar 18, 2025
Priority date	—
Expiry date	Jul 18, 2043

Classification

Technology area (CPC G)Physics
CPC primaryG01B11/24
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

The present disclosure generally relates to a system and a method for detecting a defect in a specimen. More particularly, the present disclosure relates to a lithography exposure system and a method for detecting a dispensing error in a wafer The present disclosure provides a system for detecting a defect in a specimen having a lithography exposure tool including a measurement unit and a stage, the measurement unit is configured to obtain topography data of the specimen placed on the stage by illumination of a surface of the specimen with an optical signal, and a processor configured to generate a statistical data from the topography data and produce a defect notification if the statistical data is outside of a control limit.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.