Patent · US Active

Multilayer light-filtering structure and fabricating method thereof

US12253698B2 · kind B2 · utility

0Cited by

0References

13Claims

0Family size

Assignee

GCSOL Tech Co., Ltd. · TW

Inventors

Jyun-Yi Lee · Taipei, TW
Wei Chen · Shanghai, CN

Key dates

Filing date	Apr 25, 2022
Grant date	Mar 18, 2025
Priority date	—
Expiry date	Jun 23, 2043

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/22
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A multilayer light-filtering structure includes a substrate, a light-filtering layer and a patterned light-blocking layer. The light-filtering layer is disposed on a surface of the substrate, in which the light-filtering layer has a first surface away from the substrate, and the light-filtering layer includes a plurality of high refractive index films and a plurality of low refractive index films. The low refractive index films are correspondingly overlapped with the high refractive index films. The patterned light-blocking layer is disposed on the first surface and includes a plurality of metal material films and a plurality of dielectric films. The dielectric films are correspondingly overlapped with the metal material films.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.