Patterned substrate for use in image-based classification of rock cuttings
US12254408B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Dec 15, 2020 |
| Grant date | Mar 18, 2025 |
| Priority date | — |
| Expiry date | Jan 30, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30181
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of producing an image of at least one rock cutting. The method can include forming or obtaining a substrate having a patterned top surface. The method can also include using the patterned top surface of the substrate to support at least one rock cutting, controlling an image acquisition system to acquire at least one image of the rock cutting for storage and subsequent image processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.