Microstructural image analysis device and microstructural image analysis method
US12254654B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 13, 2022 |
| Grant date | Mar 18, 2025 |
| Priority date | — |
| Expiry date | Mar 26, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/10056
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
The invention is to provide a microstructural image analysis device and a microstructural image analysis method capable of quantifying the relations in a plurality of regions included in a microstructural image. There is provided a microstructural image analysis device for analyzing a microstructural image. The microstructural image analysis device includes a region processing unit that extracts a first region and a second region from the microstructural image and expands the first region and the second region, an overlapping region extraction unit that extracts an overlapping region of both the first region and the second region each time the first region and the second region are expanded, and a persistence diagram generation unit that generates a persistence diagram based on a hole region generated and eliminated due to the overlapping region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.