Techniques for contamination detection in additive fabrication and related systems and methods
US12263648B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 20, 2023 |
| Grant date | Apr 1, 2025 |
| Priority date | — |
| Expiry date | Jun 20, 2043 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
According to some aspects, techniques are provided for identifying contamination in additive fabrication devices by measuring light interacting with the contamination using one or more light sensors. Contamination located between a light source and a target of a light source can affect the uniformity and intensity of the light source when incident upon the target. For instance, in an inverse stereolithography device, contamination located between a light source and a liquid photopolymer resin that is to be cured can affect the quality of the fabricated object when the light is scattered or blocked by the contamination. Identifying the presence of contamination between the light source and the liquid photopolymer resin and alerting the user prior to initiating a fabrication process may increase the quality of the resulting fabricated object and improve the user experience by saving time and photocurable liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.