Patent · US Active

In-situ stress measurement device and method for ultra-deep non-vertical drilling

US12264582B2 · kind B2 · utility

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2References
8Claims
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Key dates

Filing dateJun 5, 2024
Grant dateApr 1, 2025
Priority date
Expiry dateJun 5, 2044

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/10
  • WIPO fieldCivil engineering
  • WIPO sectorOther fields

Abstract

An in-situ stress measurement device for ultra-deep non-vertical drilling adopts a technical route of single channel and bidirectional rolling of in-hole equipment, and its related functions are mainly realized by a bidirectional rolling device and a split-type axial-force-free circuit switching valve. The bidirectional rolling device can drive the in-hole equipment to move freely in a circumferential direction and back and forth, which changes sliding friction between the in-hole equipment and a hole wall into rolling friction during an in-situ stress measurement of non-vertical drilling. The split-type axial-force-free circuit switching valve provides a technical solution for a single-pipe test in the non-vertical drilling. The device greatly reduces wear of the in-hole equipment and the hole wall when the in-hole equipment is installed and withdrawn, can effectively protect markings of an impression measurement, and is suitable for high-efficiency in-situ stress measurement by a hydraulic fracturing method in the non-vertical ultra-deep drilling.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.