Mirror and mirror substrate with high aspect ratio, and method and means for producing such a mirror substrate

US12265240B2 · kind B2 · utility

Assignee

• Schott AG · DE

Inventors

• Martin Schaefer · Gebenstorf, CH
• Marco Weisenburger · Undenheim, DE
• Volker Seibert · Hochheim, DE
• Thomas Westerhoff · Mainz, DE

Key dates

• Filing date: Aug 8, 2019
• Grant date: Apr 1, 2025
• Expiry date: Nov 13, 2041

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B7/183
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A mirror, a mirror substrate, a method for producing are provided. The mirror substrate is made of a material having a coefficient of mean linear thermal expansion of less than or equal to 1*10−6/K. The mirror substrate includes at least one feature selected from a group consisting of: a ratio of a lateral dimension to a maximum thickness of at least 100, a ratio of the lateral dimension to the maximum thickness of at least 150, a ratio of the lateral dimension to the maximum thickness of at least 200, a ratio of the lateral dimension to the maximum thickness of at least 300, a weight per unit area of 100 kg/m2 or less, a weight per unit area of 50 kg/m2 or less, a weight per unit area of 30 kg/m2 or less, a weight per unit area of 15 kg/m2 or less, a mirror surface with a roughness (Ra) of at most 3.5 μm, and a mirror surface with a roughness (Ra) of less than 1.2 μm.