Patent · US Active

High-resistance resistor based on silicon carbide and manufacturing method thereof

US12268013B2 · kind B2 · utility

0Cited by
0References
4Claims
0Family size

Assignees

Inventors

Key dates

Filing dateAug 11, 2022
Grant dateApr 1, 2025
Priority date
Expiry dateDec 6, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/0228
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Disclosed is a high-resistance resistor based on silicon carbide. The resistor includes a semi-insulating 4H—SiC silicon carbide substrate, a silicon surface and a carbon surface of the silicon carbide substrate are provided with symmetrical atomic-thickness aluminum oxide insulating layers, thicknesses of the aluminum oxide insulating layers are 0.2 nm-2 nm, conductive metal electrodes are formed at two sides of the aluminum oxide insulating layers through evaporation, and thicknesses of the metal electrodes are 100 nm-500 nm. The present disclosure uses a high-resistance resistor based on silicon carbide that has the above structure, makes an ohmic contact electrode on a semi-insulating silicon carbide substrate, thus obtaining a resistor with a resistance of 100 TΩ or more, and satisfying requirements of the precision measurement industry.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.