Patent · US Active

Gas barrier film

US12269241B2 · kind B2 · utility

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7Claims
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Assignee

Inventors

Key dates

Filing dateOct 26, 2022
Grant dateApr 8, 2025
Priority date
Expiry dateOct 12, 2043

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02W30/80
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A gas barrier film including: a substrate layer containing polypropylene; a resin layer containing a copolymer of propylene and another monomer; a vapor deposition layer of an inorganic oxide; and a gas barrier layer, laminated in this order, wherein the vapor deposition layer has a thickness of 5 nm to 300 nm, the resin layer has a thickness of 0.3 μm or more, and a surface of the resin layer facing the vapor deposition layer has at least one softening temperature in a range of 100° C. to 170° C. when measured by local thermal analysis (LTA).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.