Modification of particles for additive manufacturing
US12275065B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Jul 9, 2019 |
| Grant date | Apr 15, 2025 |
| Priority date | — |
| Expiry date | Dec 26, 2041 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) provide precise and conformal coatings that are employed to modify the properties of powders for additive manufacturing (AM). We have surprisingly discovered that use of a limited number of ALD cycles can impart improved flowability. In various aspects, the coating may provide one or more advantages such as novel material properties, increased flowability, improved sintering, enhanced stability during storage, and prevention of premature sintering.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.