Apparatus and method for exposure or relief precursors
US12275231B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 21, 2021 |
| Grant date | Apr 15, 2025 |
| Priority date | — |
| Expiry date | Feb 18, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus for exposure of a relief precursor having a first side and an opposite second side includes a light source to expose the relief precursor during relative movement between the light source and the relief plate precursor; a moving means to cause a first relative movement between the light source and the relief precursor to expose the first side of the relief precursor, to cause a second relative movement between the light source and the relief precursor to expose the second side of the relief precursor, and to move the light source between a first position and a second position. The first and second positions are on opposite sides of a plane of the relief precursor. At least one of the first and the second relative movement is a reciprocating movement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.