Amidinate compound, dimer compound thereof, thin-film forming raw material, and method of producing thin film
US12275748B2 · kind B2 · utility
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3Claims
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Key dates
| Filing date | Mar 31, 2021 |
| Grant date | Apr 15, 2025 |
| Priority date | — |
| Expiry date | Oct 5, 2041 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45553
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides an amidinate compound represented by the following general formula (1) or a dimer compound thereof, and a method of producing a thin-film including using the compound as a raw material: where R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms, R3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M represents a metal atom or a silicon atom, and “n” represents the valence of the atom represented by M, provided that at least one hydrogen atom of R1 to R3 is substituted with a fluorine atom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.