Patent · US Active

Single photon source

US12276834B2 · kind B2 · utility

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12Claims
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Key dates

Filing dateApr 29, 2024
Grant dateApr 15, 2025
Priority date
Expiry dateApr 29, 2044

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/95
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

A method for producing a single photon source includes functionalizing a top surface of a plasmonic thin film to form a functionalized thin film, depositing a polymer on top of the functionalized thin film, lithographically patterning the polymer to form patterned functionalized sites, and targeting nanodiamond particles to the patterned functionalized sites.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.