Single photon source
US12276834B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Apr 29, 2024 |
| Grant date | Apr 15, 2025 |
| Priority date | — |
| Expiry date | Apr 29, 2044 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/95
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method for producing a single photon source includes functionalizing a top surface of a plasmonic thin film to form a functionalized thin film, depositing a polymer on top of the functionalized thin film, lithographically patterning the polymer to form patterned functionalized sites, and targeting nanodiamond particles to the patterned functionalized sites.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.