Imprint method and article manufacturing method
US12276908B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 28, 2022 |
| Grant date | Apr 15, 2025 |
| Priority date | — |
| Expiry date | Jul 28, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0002
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An imprint method of performing an imprint process for a shot region of a substrate using a mold is provided. The substrate includes a valid region where a chip is to be formed, and an invalid region outside the valid region where no chip is to be formed, and the invalid region is a region formed by etching an outer region outside the valid region. The method includes deciding, based on a height difference between the valid region and the invalid region, an imprint condition for a partial shot region defined by an outer edge of the valid region, and performing the imprint process for the partial shot region in accordance with the decided imprint condition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.