Patent · US Active

Tungsten hexafluoride preparation method and apparatus based on photoelectric synergy

US12281025B2 · kind B2 · utility

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Key dates

Filing dateOct 30, 2024
Grant dateApr 22, 2025
Priority date
Expiry dateOct 30, 2044

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB01J19/0053
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Disclosed are a tungsten hexafluoride preparation method and apparatus based on photoelectric synergy. A photocatalyst and metal tungsten are sequentially filled in a discharge area of a plasma reactor in a direction of gas entry, and the discharge area of the plasma reactor is irradiated with light at the same time; the background gas generates a large amount of plasma in the discharge area, SF6 undergoes decomposition under the synergistic effect of photocatalysis and plasma, SF6 is decomposed to generate fluorine atoms and low-fluorine sulfides such as SF5 and SF4. The generated fluorine ions, SF5, SF4 and low-fluorine sulfides further react with metal tungsten to generate WF6 specialty gas, which not only realizes the utilization of fluorine resources of SF6, but also replaces highly toxic fluorine gas with non-toxic SF6 exhaust gas in the plasma reactor for reaction, thereby ensuring safe operation and low energy consumption.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.