Mask
US12281378B2 · kind B2 · utility
0Cited by
1References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 2, 2021 |
| Grant date | Apr 22, 2025 |
| Priority date | — |
| Expiry date | Nov 21, 2042 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/24
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A mask includes an opening area and a shelter area adjacent to the opening area, the opening area includes an opening pattern, the shelter area includes a buffer pattern adapted to the opening pattern. This application achieves a purpose that a sudden change of stress at a boundary between the opening area and the shelter area is buffered, thereby ensuring that the pull of the mesh as it opens may be smoothly transmitted from the shelter area to the opening area. In addition, this application may also effectively improve meshing accuracy of the mask, thereby improving a yield of vapor deposition products.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.