High-temperature stereolithography apparatus and methods of use thereof
US12285910B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 15, 2018 |
| Grant date | Apr 29, 2025 |
| Priority date | — |
| Expiry date | Nov 24, 2040 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29L2031/52
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
In various aspects, top-down stereolithography apparatus and methods of use thereof are provided herein that allow for additive manufacturing of an article from a high-viscosity resin. The apparatus and methods can print resins having viscosities higher than conventional systems, e.g. viscosities up to about 100 Pa·s at the elevated temperature. The resin may have a room temperature viscosity of about 100 Pa·s, about 250 Pa·s, about 1000 Pa·s, or more. In some aspects, the resin is a solid at room temperature. The apparatus and methods do not rely upon solvents or other viscosity modifiers being added to the resin, and are capable of top-down additive manufacturing approaches which provide reduced stress on the printed article.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.